DEEP DEVOTION Intensive Moisture Complex – HabibiMD

Description

Key Ingredients (AM)

NIACINAMIDE (VITAMIN B3), 5%
Promotes microcirculation, strengthens the skin’s outer layers, improves elasticity, and curbs redness and irritation.
Helpful for treating dry skin due to its ability to increase barrier lipid levels. Has anti-inflammatory properties (which
helps reduce redness), anti-bacterial properties, and melanin inhibiting properties.

CETEARYL ALCOHOL
A fatty alcohol used as an emollient, emulsifier, thickener, and carrying agent for other ingredients. A firm, wax-like
substance derived from plant oils, Cetearyl alcohol has emulsifying properties to hydrate skin and hair, leaving it soft
and supple.

BISABOLOL
Found as a natural component of chamomile, Bisabolol is an eective anti-irritant and anti-inflammatory ingredient,
helpful in soothing red, irritated skin.

CETYL HYDROXPROLINE PALMITATE (CERAMIDE)
Ceramides are lipids that hold the surface cells of the skin’s protective barrier together, helping to retain moisture and
restore and replenish the skin.

STEARIC ACID (FATTY ACID)
A fatty acid used as an emollient and emulsifier and one of three ingredients that comprise the skin’s natural lipid
barrier.

SQUALANE
Used in the synthesis of natural skin sterols essential for maintaining skin barrier function, Squalane, derived from
olives, is a biological component of human sebum and is therefore very skin friendly. It is an excellent moisturizer that
does not leave a heavy, greasy residue on the skin.

PANTHENOL (VITAMIN B5)
Enables the metabolism of carbohydrates, proteins, and lipids, increasing cellular integrity and eciency. Acts as a
moisturizer with humectant properties.

EVODIA RUTAECARPA
A naturally derived ingredient with anti-inflammatory properties.

ALLANTOIN
A substance known for its healing, soothing, and anti-irritating properties. This ingredient softens skin and stimulates
the formation of healthy tissue. Helps eliminate chapping and cracking, leaving skin silky, smooth, and healthy-looking.